2017中國國際半導(dǎo)體技術(shù)大會（CSTIC）
時間：2017-03-12 08:00 至 2017-03-13 18:00
地點(diǎn)：上海
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2017中國國際半導(dǎo)體技術(shù)大會（CSTIC） 已截止報名
會議時間： 2017-03-12 08:00至 2017-03-13 18:00結(jié)束 會議地點(diǎn)： 上海 上海國際會議中心 上海市浦東新區(qū)濱江大道2727號 周邊酒店預(yù)訂 主辦單位： SEMICON China |
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會議內(nèi)容 主辦方介紹
2017中國國際半導(dǎo)體技術(shù)大會（CSTIC）宣傳圖
中國國際半導(dǎo)體技術(shù)大會(CSTIC) 2017
China Semiconductor Technology International Conference (CSTIC) 2017
Plan now to participate at CSTIC 2017, one of the largest and the most comprehensive annual semiconductor technology conferences in China and?Asia since 2000. Organized by SEMI and??IEEE-EDS?, co-organized by IMEC and ICMTIA(The Integrated circuit Materials Industry Technology Innovation Alliance), and co-sponsored by ECS, MRS and CEMIA(the China Electronics Materials Industry Association), CSTIC 2017 will be held March 12-13, 2017 in Shanghai, China, in conjunction with SEMICON China 2017. The conference will have ten symposia cover all aspects of semiconductor technology with focus on manufacturing and advanced technology, including detail manufacturing processes, devices design, integration, materials, and equipment, as well as emerging semiconductor technologies, circuit design, and silicon material applications. Hot topics, such as memory technology, 3D integration, MEMS and Photovoltaic Technology will also be addressed in the conference.
Date and Venue
March 12-13, 2017
Shanghai International Convention Center
上海國際會議中心 中國上海浦東濱江大道2727號
No.2727 Riverside Avenue Pudong, Shanghai 200120, China
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會議日程
（最終日程以會議現(xiàn)場為準(zhǔn)）
| 08:45–09:30 | Opening Ceremony |
| ? | Opening Remarks by Conference Chair |
| ? | Opening Remarks by SEMI |
| ? | Opening Remarks by IMEC |
| ? | Opening Remarks by Chinese Government Representatives |
| ? | Presentation of SEMI Best Student Paper Awards and SEMI Best Young Engineer |
| ? | Paper Awards |
| ? | ? |
| Meeting Room | 3rd Floor Auditorium |
| ? | ? |
| 09:30 –10:10 | Prof.Hiroshi Amano |
| ? | Nobel Laureate in Physics, 2014 |
| ? | Director, Center for Integrated Research of Future Electronics, Institute of Materials and Systems for Sustainability, Nagoya University |
| ? | ? |
| 10:10–10:25 | Coffee Break |
| ? | ? |
| 10:25–11:05 | Dr.Tzu-Yin Chiu |
| ? | CEO and Executive Director,Semiconductor Manufacturing International Corp.(SMIC) |
| ? | ? |
| 11:05–11:35 | Dr.Jong Shik Yoon |
| ? | Executive Vice President Foundry Business System-LSI,Samsung Electronics Co,LTD,Korea. |
| ? | ? |
| 11:35–12:05 | Prof.Rao Tummala |
| ? | Joseph.M Pettit Chair Professor in ECE and MSE Director, 3D Microsystems Packaging Research Center Georgia Research Alliance Eminent Scholar Georgia Institute of Technology, Atlanta, Ga, USA |
| ? | ? |
| 12:05–13:30 | 7th Floor Grand Ballroom 1 |
Panel Discussion
Sunday, March 12, 2017
Meeting Room: 3B
17:00-18:00
Moderator:
Panel Members:
?
Parallel Symposium Oral Sessions?
| Sunday, March 12, 2017 | |
| 13:30 – 18:00 | Parallel Symposium Oral Sessions |
| ? | ? |
| Coffee Break | Conference Poster Session |
| ? | ? |
| Monday,March 13,2017 | |
| 8:00-18:00 | Parallel Symposium Oral Sessions |
| ? | ? |
Joint Sessions
Symposium II and Symposium III-Lithograpy/Etch joint session
Sunday, March 12, 2017
Shanghai International Convention Cente
Meeting Room: 3rd Floor Yellow River Hall黃河廳
Session Chairs: Kafai Lai (IBM) and Ying Zhang (Applied Material)
?
| 13:30-13:35 | Opening Remarks |
| ? | Kafai Lai / Ying Zhang |
| **13:35-14:05 | TBD |
| ? | Donis Flagello, Nikon Research America |
| **14:05-14:35 | Patterning Technology Inflections for the 10n and Beyond Logic Nodes |
| ? | Rich Wise, Lam Research |
| *14:35-14:55 | Development of 250W EUV light source for HConsiderations for pattern fidelity control towards 5nm nodeVM lithography |
| ? | Hidetami Yaegashi, TEL |
| *14:55-15:15 | The Insertion of extreme ultraviolet lithography (EUVL) from patterning perspective |
| ? | Weimin Gao, Synopsys |
| 15:15-15:30 | Coffee Break |
| ? | ? |
Symposium II and Symposium IX-DTCO Joint session
Monday, March 13, 2017
Shanghai International Convention Center
Meeting Room: 3rd Floor Yellow River Hall黃河廳
Session chairs: Leo Pang / Yiyu Shi
| *8:30-8:35 | Opening Remarks |
| ? | Leo Pang / Yiyu Shi |
| **8:35-9:05 | Design Technology Co-optimization for Disruptive Patterning Schemes |
| ? | Puneet Gupta, UCLA |
| **9:05-9:35 | TBD |
| ? | Shaojun Wei, Tsinghua University |
| *9:35-9:55 | TBD |
| ? | Luigi Capodieci, Motovi.ai |
| 9:55-10:10 | Coffee Break |
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會議嘉賓
（最終出席嘉賓以會議現(xiàn)場為準(zhǔn)）
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朱志敏
布魯爾科技有限公司
博士
王欣然
南京大學(xué)
教授
SangBum Kim
IBM
researcher
Dr. Qingtai Zhao
Forschungszentrum Julich
researcher
Min-hwa Chi
中芯國際
副總裁
參會指南
會議門票 場館介紹
提前注冊并付費(fèi) | 注冊費(fèi) | |
聽眾 | 人民幣?3,700 | 人民幣?4,200 |
學(xué)生（持有效證件） | 人民幣?2,100 | 人民幣?2,600 |
晚宴（3月12日18:00-20:00） | 人民幣?600 | 人民幣?800 |
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上海國際會議中心
交通指南：
地鐵二號線陸家嘴站、外灘觀光隧道、583、621、623、776、778、870、872路、申高線、旅游江園線(濱江大道終點(diǎn)站)、82、85、581B、795路、陸家嘴環(huán)線（陸家嘴地鐵站終點(diǎn)站）、81、797、983、旅游3號線、錦江觀光巴士到東方明珠后步行5分鐘即到。
上海國際會議中心地處陸家嘴金融貿(mào)易中心，毗鄰東方明珠電視塔，與外灘萬國建筑群隔江相望，交通設(shè)施方便快捷，地理位置得天獨(dú)厚，于1999年8月落成并正式對外營業(yè)?？偨ㄖ娣e11萬平方米，作為上海標(biāo)志性新景觀，被評為建國五十年十大經(jīng)典建筑之一。 上海國際會議中心素以舉辦大型國際會議、商務(wù)論壇而蜚聲海內(nèi)外。位于酒店7樓的上海廳可同時容納3000人會議，是目前國內(nèi)最大的無柱型多功能廳，28個大小不等、風(fēng)格迥異的多功能會議廳，均備有最先進(jìn)的高科技影音系統(tǒng)及同聲傳譯設(shè)備。 內(nèi)設(shè)五星級的，擁有273間景觀豪華客房、風(fēng)格迥異的餐廳設(shè)施以及豐富多樣的娛樂與健身設(shè)施。
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